Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...
The allure of modular systems is multifaceted, but perhaps the most important aspect is the efficiency. Standardized components, built off-site in specialized facilities reduce material use, minimize ...
Synopsys (NASDAQ:SNPS) announced a broad Electronic Design Automation, or EDA, and Intellectual Property collaboration with Intel Foundry (NASDAQ:INTC). The announcement was made at the Intel Foundry ...
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